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Quartz Wafer
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Semiconductor Wafer
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BOROFLOAT 33 BF33 Glass Wafer for MEMS Wafer Bonding and Optical Packaging
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Thin-Film Lithium Niobate on Insulator (LNOI) Wafer Platform for Integrated Photonics
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Alumina Ceramic Heat Sink Plate 310×310 mm High Purity Al₂O₃ Thermal Substrate
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TFLN / TFLT on SiPh Platform for High-Speed Optical Modulators & Hybrid Photonics
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Lithium Tantalate on Insulator LTOI Wafers for RF Filters
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LNOI Wafer for High-Speed Modulator, RF Filter & Photonic Integrated Circuits
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Soda-Lime Glass Wafers for Thin Film & MEMS Applications
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Custom High Borosilicate Glass Wafers for MEMS, Semiconductor & Optical Applications (2–12”)
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BF33 / BOROFLOAT 33 Glass Wafer – High-Performance Borosilicate Wafer
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2-Inch 6H-N Silicon Carbide (SiC) Wafer – Single Crystal Substrate 350μm / 650μm
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4-Inch HPSI Silicon Carbide (SiC) Wafer 350μm for AR Glasses and High-Power Electronics
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