Custom Fused Quartz Plates with Through Holes are high-precision engineered components manufactured from ultra-high purity silicon dioxide (SiO₂ > 99.9%). These plates are specifically designed for advanced industrial and scientific applications where thermal stability, chemical resistance, and optical performance are critical.
Unlike standard glass materials, fused quartz offers a unique combination of low thermal expansion, high temperature resistance, and broad optical transmission, making it ideal for semiconductor, photonics, and laboratory systems. By integrating precision-drilled holes, these quartz plates enable controlled fluid flow, gas distribution, or optical alignment, transforming them from passive substrates into functional system components.
Available in multiple grades such as JGS1, JGS2, and JGS3, these products can be tailored to meet different wavelength requirements, from deep ultraviolet (UV) to infrared (IR) applications.
Key Features
- Ultra-high purity quartz (SiO₂ > 99.9%) ensuring excellent optical clarity
- Custom hole size, position, and geometry based on CAD drawings
- Outstanding thermal resistance (up to 1100°C continuous use)
- Extremely low thermal expansion for dimensional stability
- High chemical resistance (except hydrofluoric acid)
- Optical polishing available for precision applications
- Compatible with cleanroom and high-purity environments
- Suitable for both structural and optical integration
Material Grades
JGS1 – UV Grade Fused Silica
JGS1 offers excellent transmission from 185 nm to 2500 nm, making it ideal for deep UV applications such as lithography, UV lasers, and high-energy optical systems. It features very low hydroxyl (OH⁻) content and minimal birefringence.
JGS2 – Optical Grade Quartz
JGS2 is widely used for visible and near-infrared applications (260–2500 nm). It provides high optical uniformity and is a cost-effective solution for general optical systems.
JGS3 – Infrared Quartz Glass
JGS3 is optimized for infrared applications and industrial use. While it has lower transmission in the deep UV range, it performs well in thermal and IR-related environments.
Manufacturing Process
The production of custom fused quartz plates requires strict process control to ensure precision and consistency:
1. Material Selection
High-purity quartz ingots are selected and prepared according to application requirements.
2. Precision Cutting & Shaping
Advanced CNC machining, waterjet cutting, or laser cutting is used to achieve custom dimensions and geometries.
3. Hole Drilling
Through-holes are created using specialized techniques such as ultrasonic drilling, CO₂ laser drilling, or mechanical drilling, depending on tolerance and surface quality requirements.
4. Surface Processing
Optical polishing (single-side or double-side) is applied to achieve high surface flatness and low roughness. Edge finishing, chamfering, and chemical polishing are also available.
5. Cleaning & Inspection
All components undergo rigorous cleaning in controlled environments and are inspected for dimensional accuracy, surface quality, and optical performance.
Technical Specifications（参数表）
| Property | Typical Value |
|---|---|
| Diameter | 10 mm – 600 mm |
| Length | 10 mm – 1000 mm |
| Width | 10 mm – 1000 mm |
| Thickness | 0.5 mm – 60 mm |
| Material | High Purity SiO₂ (>99.9%) |
| Density | 2.2 × 10³ kg/m³ |
| Hardness | 5.3 – 6.5 (Mohs) |
| Compressive Strength | ＞1.1 × 10⁹ Pa |
| Thermal Expansion | 5.5 × 10⁻⁷ /℃ |
| Max Temperature (Short Term) | 1200℃ |
| Max Temperature (Long Term) | 1100℃ |
| Softening Point | 1730℃ |
| Refractive Index | 1.4585 |
| Transmittance | ≥85% |
Applications
Thanks to their unique combination of mechanical strength, optical clarity, and structural customization, these quartz plates are widely used across multiple industries:
Semiconductor Industry
Used as wafer carriers, gas distribution plates (showerheads), and structural components in etching and deposition systems. Their high purity ensures compatibility with cleanroom processes.
Microfluidics and Life Sciences
Precision-drilled holes enable fluid control in microfluidic chips, lab-on-chip devices, and analytical instruments.
Optics and Photonics
Applied in optical masks, apertures, laser windows, and beam alignment systems where high transmission and stability are required.
Scientific Research
Used in custom reaction chambers, high-temperature experiments, and corrosive environments where standard materials cannot perform reliably.
Chemical and Pharmaceutical Equipment
Ideal for flow reactors, sampling systems, and UV/IR spectroscopy cells requiring chemical resistance and optical access.
FAQ
Q1: Can hole size and position be fully customized?
Yes, all dimensions including hole diameter (0.1–20 mm), position, and layout can be customized based on CAD drawings.
Q2: What is the difference between JGS1 and JGS2?
JGS1 is designed for deep UV applications with higher purity, while JGS2 is more suitable for visible and near-infrared applications with better cost efficiency.
Q3: Are these quartz plates chemically resistant?
Yes, fused quartz is highly resistant to most acids and chemicals, except hydrofluoric acid (HF).
Q4: Can multiple holes or complex shapes be produced?
Yes, multi-hole designs, slots, and complex geometries are fully supported.
Reviews
There are no reviews yet.