{"id":2661,"date":"2026-04-13T06:09:54","date_gmt":"2026-04-13T06:09:54","guid":{"rendered":"https:\/\/www.fuyao-quartz.com\/?p=2661"},"modified":"2026-04-13T06:19:05","modified_gmt":"2026-04-13T06:19:05","slug":"quartz-glassware-and-machined-quartz-components-in-engineering-applications","status":"publish","type":"post","link":"https:\/\/www.fuyao-quartz.com\/cs\/quartz-glassware-and-machined-quartz-components-in-engineering-applications\/","title":{"rendered":"K\u0159emenn\u00e9 sklo a obr\u00e1b\u011bn\u00e9 k\u0159emenn\u00e9 komponenty v technick\u00fdch aplikac\u00edch"},"content":{"rendered":"

1. \u00davod <\/h2>\n\n\n\n

K\u0159emenn\u00e9 sklo a obr\u00e1b\u011bn\u00e9 k\u0159emenn\u00e9 komponenty <\/a>jsou \u0161iroce pou\u017e\u00edv\u00e1ny p\u0159i v\u00fdrob\u011b polovodi\u010d\u016f, v optick\u00e9 technice, p\u0159i vysokoteplotn\u00edm zpracov\u00e1n\u00ed a ve vakuov\u00fdch syst\u00e9mech. S rozvojem polovodi\u010dov\u00e9 technologie sm\u011brem k sub-7nm uzl\u016fm a roz\u0161i\u0159ov\u00e1n\u00edm vysoce v\u00fdkonn\u00fdch fotonick\u00fdch syst\u00e9m\u016f popt\u00e1vka po k\u0159emenn\u00fdch materi\u00e1lech s velmi vysokou \u010distotou st\u00e1le roste.<\/p>\n\n\n\n

Podle informac\u00ed spole\u010dnosti Semiconductor Equipment and Materials International (Semiconductor Equipment and Materials International) (SEMI<\/strong>) jsou komponenty na b\u00e1zi k\u0159emene z\u00e1kladn\u00edm spot\u0159ebn\u00edm materi\u00e1lem v za\u0159\u00edzen\u00edch pro tepeln\u00e9 zpracov\u00e1n\u00ed. Jejich \u017eivotnost je d\u00e1na p\u0159edev\u0161\u00edm \u00fanavou z tepeln\u00e9ho cyklu (\u010dasto p\u0159i provozn\u00edch podm\u00ednk\u00e1ch nad 1000 \u00b0C) a prahov\u00fdmi hodnotami zne\u010di\u0161t\u011bn\u00ed, nikoli mechanick\u00fdm po\u0161kozen\u00edm.<\/p>\n\n\n\n

\"\"<\/figure>\n\n\n\n

2. Definice materi\u00e1lu a v\u011bdeck\u00fd z\u00e1klad<\/h2>\n\n\n\n

Taven\u00fd k\u0159emen (taven\u00fd oxid k\u0159emi\u010dit\u00fd) je amorfn\u00ed forma oxidu k\u0159emi\u010dit\u00e9ho (SiO\u2082) s extr\u00e9mn\u011b vysokou \u010distotou:<\/p>\n\n\n\n

    \n
  • Pr\u016fmyslov\u00e1 t\u0159\u00edda: \u226599,9% SiO\u2082<\/li>\n\n\n\n
  • Polovodi\u010dov\u00e1 t\u0159\u00edda: \u226599,99% SiO\u2082<\/li>\n\n\n\n
  • Ultra vysok\u00e1 \u010distota optick\u00e9 t\u0159\u00eddy: a\u017e 99,999% SiO\u2082<\/li>\n<\/ul>\n\n\n\n

    Na rozd\u00edl od krystalick\u00e9ho k\u0159emene nem\u00e1 taven\u00fd oxid k\u0159emi\u010dit\u00fd hranice zrn, co\u017e v\u00fdrazn\u011b sni\u017euje hustotu defekt\u016f a zlep\u0161uje tepelnou a optickou stabilitu.<\/p>\n\n\n\n

    Kl\u00ed\u010dov\u00e9 fyzik\u00e1ln\u00ed vlastnosti<\/h3>\n\n\n\n
      \n
    • Koeficient tepeln\u00e9 rozta\u017enosti: ~0,5 \u00d7 10-\u2076 \/K (20-300 \u00b0C)<\/li>\n\n\n\n
    • Bod m\u011bknut\u00ed: ~1665 \u00b0C<\/li>\n\n\n\n
    • Trval\u00e1 provozn\u00ed teplota: 1100-1200\u00b0C<\/li>\n\n\n\n
    • Mezn\u00ed hodnota propustnosti UV z\u00e1\u0159en\u00ed: ~180 nm<\/li>\n\n\n\n
    • Hustota: ~2,2 g\/cm\u00b3<\/li>\n<\/ul>\n\n\n\n

      \ud83d\udccc Zdroje dat: K\u0159emenn\u00e9 sklo Heraeus: Technick\u00e9 listy taven\u00e9ho oxidu k\u0159emi\u010dit\u00e9ho Corning, P\u0159\u00edru\u010dka k\u0159emenn\u00e9ho skla Heraeus.<\/p>\n\n\n\n

      3. V\u00fdrobn\u00ed procesy a pr\u016fmyslov\u00e9 normy<\/h2>\n\n\n\n

      K\u0159emenn\u00e9 sklo a opracovan\u00e9 k\u0159emenn\u00e9 komponenty se vyr\u00e1b\u011bj\u00ed podle p\u0159\u00edsn\u00fdch pr\u016fmyslov\u00fdch norem, aby byla zaji\u0161t\u011bna \u010distota, konzistence a rozm\u011brov\u00e1 p\u0159esnost.<\/p>\n\n\n\n

      3.1 Kl\u00ed\u010dov\u00e9 pr\u016fmyslov\u00e9 normy<\/h3>\n\n\n\n
        \n
      • ASTM C1663 - Standardn\u00ed specifikace pro materi\u00e1ly z taven\u00e9ho oxidu k\u0159emi\u010dit\u00e9ho<\/li>\n\n\n\n
      • ISO 9001 - Syst\u00e9my \u0159\u00edzen\u00ed kvality<\/li>\n\n\n\n
      • SEMI F57 - Specifikace k\u0159emenn\u00fdch materi\u00e1l\u016f vysok\u00e9 \u010distoty pou\u017e\u00edvan\u00fdch v polovodi\u010dov\u00fdch za\u0159\u00edzen\u00edch<\/li>\n<\/ul>\n\n\n\n

        Tyto normy upravuj\u00ed:<\/p>\n\n\n\n

          \n
        • Obsah kovov\u00fdch p\u0159\u00edm\u011bs\u00ed (Fe, Al, Na, K atd.)<\/li>\n\n\n\n
        • Hustota bublin a inkluz\u00ed<\/li>\n\n\n\n
        • Obsah hydroxylu (OH) ovliv\u0148uj\u00edc\u00ed optick\u00fd p\u0159enos<\/li>\n\n\n\n
        • Rozm\u011brov\u00e9 tolerance a po\u017eadavky na \u010distotu<\/li>\n<\/ul>\n\n\n\n

          3.2 V\u00fdrobn\u00ed pracovn\u00ed postup<\/h3>\n\n\n\n
            \n
          1. \u010ci\u0161t\u011bn\u00ed surovin<\/strong>
            Vysoce \u010dist\u00fd p\u0159\u00edrodn\u00ed k\u0159emen nebo syntetick\u00fd oxid k\u0159emi\u010dit\u00fd se chemicky rafinuje, aby se odstranily stopov\u00e9 kovov\u00e9 ne\u010distoty.<\/li>\n\n\n\n
          2. Vysokoteplotn\u00ed f\u00faze (>1800 \u00b0C)<\/strong>
            K v\u00fdrob\u011b amorfn\u00edho k\u0159emi\u010dit\u00e9ho skla se pou\u017e\u00edv\u00e1 elektrick\u00fd oblouk nebo plamenn\u00e1 hydrol\u00fdza.<\/li>\n\n\n\n
          3. Proces tv\u00e1\u0159en\u00ed<\/strong>
            Zahrnuje ta\u017een\u00ed trubek, lisov\u00e1n\u00ed a odst\u0159ediv\u00e9 lit\u00ed pro v\u00fdrobu z\u00e1kladn\u00edho skla.<\/li>\n\n\n\n
          4. P\u0159esn\u00e9 obr\u00e1b\u011bn\u00ed (CNC \/ laser \/ ultrazvuk)<\/strong>
            Pou\u017e\u00edv\u00e1 se k v\u00fdrob\u011b p\u0159\u00edrub, optick\u00fdch oken, reak\u010dn\u00edch trubek a konstruk\u010dn\u00edch prvk\u016f.<\/li>\n\n\n\n
          5. Proces \u017e\u00edh\u00e1n\u00ed<\/strong>
            \u0158\u00edzen\u00e9 chlazen\u00ed sni\u017euje vnit\u0159n\u00ed pnut\u00ed a zvy\u0161uje rozm\u011brovou stabilitu.<\/li>\n<\/ol>\n\n\n\n

            \ud83d\udccc Pozn\u00e1mka pro pr\u016fmysl: Obr\u00e1b\u011bn\u00ed k\u0159emene pro polovodi\u010de se obvykle prov\u00e1d\u00ed v \u010dist\u00fdch prostor\u00e1ch t\u0159\u00eddy 5-7 podle normy ISO, aby se zabr\u00e1nilo kontaminaci \u010d\u00e1sticemi.<\/p>\n\n\n\n

            4. Obr\u00e1b\u011bn\u00e9 k\u0159emenn\u00e9 komponenty<\/h2>\n\n\n\n

            Obr\u00e1b\u011bn\u00e9 k\u0159emenn\u00e9 sou\u010d\u00e1sti jsou funk\u010dn\u00ed technick\u00e9 d\u00edly ur\u010den\u00e9 sp\u00ed\u0161e pro vysoce p\u0159esn\u00e9 a spolehliv\u00e9 aplikace ne\u017e pro jednoduch\u00e9 sklen\u011bn\u00e9 v\u00fdrobky.<\/p>\n\n\n\n

            4.1 Typick\u00e9 sou\u010d\u00e1sti<\/h3>\n\n\n\n
              \n
            • Polovodi\u010dov\u00e9 reak\u010dn\u00ed trubice<\/li>\n\n\n\n
            • Optick\u00e1 okna a laserov\u00e9 pr\u016fzory<\/li>\n\n\n\n
            • Okna vakuov\u00e9 komory<\/li>\n\n\n\n
            • K\u0159emenn\u00e9 p\u0159\u00edruby a t\u011bsnic\u00ed krou\u017eky<\/li>\n\n\n\n
            • Vysokoteplotn\u00ed konstruk\u010dn\u00ed podp\u011bry<\/li>\n<\/ul>\n\n\n\n

              4.2 Po\u017eadavky na p\u0159esnost<\/h3>\n\n\n\n
                \n
              • Rozm\u011brov\u00e1 tolerance: \u00b10,01 mm (p\u0159esn\u00e1 t\u0159\u00edda)<\/li>\n\n\n\n
              • Drsnost povrchu: Ra \u2264 0,2-0,4 \u03bcm (optick\u00e1 t\u0159\u00edda)<\/li>\n\n\n\n
              • Plochost: a\u017e \u03bb\/10 pro \u0161pi\u010dkov\u00e9 optick\u00e9 aplikace<\/li>\n<\/ul>\n\n\n\n

                \ud83d\udccc Technick\u00e9 reference: Heraeus Quartz Machining Guide, Momentive Engineering Specifications<\/p>\n\n\n\n

                5. Technick\u00e9 aplikace<\/h2>\n\n\n\n

                5.1 V\u00fdroba polovodi\u010d\u016f<\/h3>\n\n\n\n

                K\u0159emenn\u00e9 komponenty se \u0161iroce pou\u017e\u00edvaj\u00ed v:<\/p>\n\n\n\n

                  \n
                • Syst\u00e9my difuzn\u00edch pec\u00ed<\/li>\n\n\n\n
                • Komory pro chemick\u00e9 napa\u0159ov\u00e1n\u00ed (CVD)<\/li>\n\n\n\n
                • Plazmov\u00e9 leptac\u00ed za\u0159\u00edzen\u00ed<\/li>\n\n\n\n
                • Oxida\u010dn\u00ed procesy desti\u010dek<\/li>\n<\/ul>\n\n\n\n

                  Z \u00fadaj\u016f SEMI vypl\u00fdv\u00e1, \u017ee k\u0159emenn\u00e9 spot\u0159ebn\u00ed materi\u00e1ly p\u0159edstavuj\u00ed v\u00fdznamnou \u010d\u00e1st materi\u00e1l\u016f pro \u00fadr\u017ebu za\u0159\u00edzen\u00ed pro tepeln\u00e9 procesy, p\u0159i\u010dem\u017e degradace je zp\u016fsobena p\u0159edev\u0161\u00edm tepeln\u00fdm cyklem p\u0159i teplot\u00e1ch nad 1000 \u00b0C a povrchovou kontaminac\u00ed.<\/p>\n\n\n\n

                  5.2 Optick\u00e9 a laserov\u00e9 syst\u00e9my<\/h3>\n\n\n\n

                  K\u0159emenn\u00e9 sklo nab\u00edz\u00ed vynikaj\u00edc\u00ed propustnost od hlubok\u00e9ho ultrafialov\u00e9ho z\u00e1\u0159en\u00ed a\u017e po vlnov\u00e9 d\u00e9lky bl\u00edzk\u00e9 infra\u010derven\u00e9mu z\u00e1\u0159en\u00ed:<\/p>\n\n\n\n

                    \n
                  • Vysok\u00e1 UV pr\u016fhlednost (do ~180 nm)<\/li>\n\n\n\n
                  • N\u00edzk\u00e9 fluorescen\u010dn\u00ed pozad\u00ed<\/li>\n\n\n\n
                  • Vysok\u00fd pr\u00e1h po\u0161kozen\u00ed laserem<\/li>\n<\/ul>\n\n\n\n

                    Mezi aplikace pat\u0159\u00ed:<\/p>\n\n\n\n

                      \n
                    • Excimerov\u00e9 lasery (193 nm, 248 nm)<\/li>\n\n\n\n
                    • Spektroskopick\u00e9 syst\u00e9my<\/li>\n\n\n\n
                    • Leteck\u00e9 optick\u00e9 p\u0159\u00edstroje<\/li>\n<\/ul>\n\n\n\n

                      5.3 Vakuov\u00e9 a vysokoenergetick\u00e9 syst\u00e9my<\/h3>\n\n\n\n

                      K\u0159emenn\u00e9 materi\u00e1ly se \u0161iroce pou\u017e\u00edvaj\u00ed v:<\/p>\n\n\n\n

                        \n
                      • Vakuov\u00e9 komory<\/li>\n\n\n\n
                      • Syst\u00e9my pro zpracov\u00e1n\u00ed plazmatu<\/li>\n\n\n\n
                      • Za\u0159\u00edzen\u00ed pro fyziku vysok\u00fdch energi\u00ed<\/li>\n<\/ul>\n\n\n\n

                        Zpr\u00e1vy NASA o v\u00fdzkumu materi\u00e1l\u016f zd\u016fraz\u0148uj\u00ed taven\u00fd oxid k\u0159emi\u010dit\u00fd jako preferovan\u00fd materi\u00e1l pro vesm\u00edrn\u00e9 optick\u00e9 syst\u00e9my d\u00edky jeho stabilit\u011b ve vakuu a odolnosti v\u016f\u010di z\u00e1\u0159en\u00ed.<\/p>\n\n\n\n

                        5.4 Vysokoteplotn\u00ed pr\u016fmyslov\u00e9 syst\u00e9my<\/h3>\n\n\n\n

                        K\u0159emenn\u00e9 komponenty spolehliv\u011b funguj\u00ed v prost\u0159ed\u00ed s teplotou nad 1100 \u00b0C, v\u010detn\u011b:<\/p>\n\n\n\n

                          \n
                        • Trubky pece<\/li>\n\n\n\n
                        • Tepeln\u00e9 reaktory<\/li>\n\n\n\n
                        • Spalovac\u00ed syst\u00e9my<\/li>\n<\/ul>\n\n\n\n

                          V porovn\u00e1n\u00ed s borosilik\u00e1tov\u00fdm sklem poskytuje taven\u00fd k\u0159emen v\u00fdrazn\u011b vy\u0161\u0161\u00ed tepelnou stabilitu a ni\u017e\u0161\u00ed riziko deformace.<\/p>\n\n\n\n

                          6. Srovn\u00e1n\u00ed materi\u00e1l\u016f pro technick\u00fd v\u00fdb\u011br<\/h2>\n\n\n\n

                          K\u0159emenn\u00e9 sklo vs. borosilik\u00e1tov\u00e9 sklo<\/h3>\n\n\n\n
                          Majetek<\/th>K\u0159emenn\u00e9 sklo<\/th>Borosilik\u00e1tov\u00e9 sklo<\/th><\/tr><\/thead>
                          Trval\u00e1 pracovn\u00ed teplota<\/td>1100-1200\u00b0C<\/td>~500\u00b0C<\/td><\/tr>
                          Koeficient tepeln\u00e9 rozta\u017enosti<\/td>Extr\u00e9mn\u011b n\u00edzk\u00e1<\/td>M\u00edrn\u00e1<\/td><\/tr>
                          P\u0159enos UV z\u00e1\u0159en\u00ed<\/td>Vynikaj\u00edc\u00ed<\/td>Omezen\u00e9<\/td><\/tr>
                          Chemick\u00e1 \u010distota<\/td>Velmi vysok\u00e1<\/td>St\u0159edn\u00ed<\/td><\/tr>
                          N\u00e1klady<\/td>Vysok\u00e1<\/td>Doln\u00ed<\/td><\/tr><\/tbody><\/table><\/figure>\n\n\n\n

                          \ud83d\udccc Reference: Technick\u00e9 \u00fadaje o skle Schott AG, srovn\u00e1vac\u00ed tabulky materi\u00e1l\u016f Corning<\/p>\n\n\n\n

                          7. Omezen\u00ed a technick\u00e9 aspekty<\/h2>\n\n\n\n

                          Navzdory sv\u00fdm vynikaj\u00edc\u00edm vlastnostem m\u00e1 k\u0159emenn\u00e9 sklo n\u011bkolik omezen\u00ed:<\/p>\n\n\n\n

                            \n
                          • K\u0159ehk\u00e9 lomov\u00e9 chov\u00e1n\u00ed p\u0159i mechanick\u00e9m n\u00e1razu<\/li>\n\n\n\n
                          • Vysok\u00e9 v\u00fdrobn\u00ed a obr\u00e1b\u011bc\u00ed n\u00e1klady<\/li>\n\n\n\n
                          • Chemick\u00e1 zranitelnost v\u016f\u010di kyselin\u011b fluorovod\u00edkov\u00e9 (HF)<\/li>\n\n\n\n
                          • Citlivost na tvorbu mikrotrhlin p\u0159i nam\u00e1h\u00e1n\u00ed<\/li>\n<\/ul>\n\n\n\n

                            Mezi technick\u00e9 strategie zm\u00edrn\u011bn\u00ed dopad\u016f pat\u0159\u00ed:<\/p>\n\n\n\n

                              \n
                            • Optimalizovan\u00fd konstruk\u010dn\u00ed n\u00e1vrh pro sn\u00ed\u017een\u00ed koncentrace nap\u011bt\u00ed<\/li>\n\n\n\n
                            • V\u011bt\u0161\u00ed tlou\u0161\u0165ka v nosn\u00fdch oblastech<\/li>\n\n\n\n
                            • \u0158\u00edzen\u00e9 procesy tepeln\u00e9ho n\u00e1b\u011bhu a ochlazov\u00e1n\u00ed<\/li>\n<\/ul>\n\n\n\n

                              8. V\u00fdhled odv\u011btv\u00ed<\/h2>\n\n\n\n

                              Popt\u00e1vka po vysoce \u010dist\u00fdch k\u0159emenn\u00fdch sou\u010d\u00e1stk\u00e1ch st\u00e1le roste d\u00edky:<\/p>\n\n\n\n

                                \n
                              • Roz\u0161\u00ed\u0159en\u00ed pokro\u010dil\u00fdch polovodi\u010dov\u00fdch tov\u00e1ren (3-7 nm uzly)<\/li>\n\n\n\n
                              • Zvy\u0161ov\u00e1n\u00ed v\u00fdroby \u010dip\u016f s um\u011blou inteligenc\u00ed<\/li>\n\n\n\n
                              • R\u016fst v\u00fdkonov\u00e9 elektroniky a fotonick\u00fdch syst\u00e9m\u016f<\/li>\n\n\n\n
                              • Rostouc\u00ed popt\u00e1vka po p\u0159esn\u00fdch k\u0159emenn\u00fdch sou\u010d\u00e1stk\u00e1ch na m\u00edru<\/li>\n<\/ul>\n\n\n\n

                                Podle shody v odv\u011btv\u00ed z\u016fst\u00e1v\u00e1 k\u0159emenn\u00fd spot\u0159ebn\u00ed materi\u00e1l kritickou kategori\u00ed materi\u00e1l\u016f p\u0159i v\u00fdrob\u011b polovodi\u010d\u016f, proto\u017ee m\u00e1 p\u0159\u00edm\u00fd vliv na stabilitu procesu a v\u00fdt\u011b\u017enost.<\/p>\n\n\n\n

                                9. Z\u00e1v\u011br<\/h2>\n\n\n\n

                                K\u0159emenn\u00e9 sklo a opracovan\u00e9 k\u0159emenn\u00e9 sou\u010d\u00e1sti hraj\u00ed z\u00e1sadn\u00ed roli v modern\u00edch technick\u00fdch syst\u00e9mech. D\u00edky kombinaci tepeln\u00e9 odolnosti, optick\u00e9 pr\u016fhlednosti a chemick\u00e9 st\u00e1losti jsou nepostradateln\u00e9 p\u0159i zpracov\u00e1n\u00ed polovodi\u010d\u016f, v optick\u00fdch technologi\u00edch a v pr\u016fmyslov\u00fdch aplikac\u00edch p\u0159i vysok\u00fdch teplot\u00e1ch.<\/p>\n\n\n\n

                                S pokra\u010duj\u00edc\u00edm pokrokem v oblasti p\u0159esn\u00e9 v\u00fdroby a velmi \u010dist\u00e9ho zpracovatelsk\u00e9ho prost\u0159ed\u00ed se o\u010dek\u00e1v\u00e1, \u017ee popt\u00e1vka po k\u0159emenn\u00fdch sou\u010d\u00e1stk\u00e1ch na m\u00edru bude v odv\u011btv\u00edch \u0161pi\u010dkov\u00fdch technologi\u00ed neust\u00e1le r\u016fst.<\/p>","protected":false},"excerpt":{"rendered":"

                                1. Introduction Quartz glassware and machined quartz components are widely used in semiconductor manufacturing, optical engineering, high-temperature processing, and vacuum systems. As semiconductor technology advances toward sub-7nm nodes and high-performance photonic systems expand, demand for ultra-high-purity quartz materials continues to increase. According to industry insights from the Semiconductor Equipment and Materials International (SEMI), quartz-based components 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